Items where Author is "M., Othman,"

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Number of items: 7.

Article

M., Othman, (2014) A Survey of Mobile Cloud Computing Application Models. pp. 393-413.

S.M.A., Gani, and N.H., Khanis, and M., Othman, and N.M.A., Rahman, and S.A., Rahman, and R., Ritikos, (2014) Effects of hydrogen dilution on CNx film properties deposited using rf PECVD from a mixture of ethane, nitrogen and hydrogen. Materials Chemistry and Physics, 144. pp. 377-384.

S.M., Ab Gani, and N.H., Khanis, and M.R., Muhamad, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2013) Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power. Thin Solid Films, 529. pp. 459-463.

S.M., Ab Gani, and N.H., Khanis, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2013) Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template. MATERIALS CHEMISTRY AND PHYSICS, 138 (2-3). pp. 514-518.

S.M., Ab Gani, and N.H., Khanis, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2013) Effect of N2 flow rate on the properties of CNx thin films prepared by radio frequency plasma enhanced chemical vapor deposition from ethane and nitrogen. Thin Solid Films, 529. pp. 439-443.

S.M.A., Gani, and N.H., Khanis, and M.R., Muhamad, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2011) Effects of rf power on the structural properties of carbon nitride thin films prepared by plasma enhanced chemical vapour deposition. Thin Solid Films, 519 (15). pp. 4981-4986.

Piaw, Chua Yan and M., Othman, and T., Rohani, A. and N., Sharifah, M. (2002) Learning and thinking styles, creative thinking and critical thinking abilities of the Malaysian male and female students. International journal of learning, 9. pp. 1354-1362.

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