Items where Author is "N.M.A., Rashid,"

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Article

S.M., Ab Gani, and N.H., Khanis, and M.R., Muhamad, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2013) Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power. Thin Solid Films, 529. pp. 459-463.

S.M., Ab Gani, and N.H., Khanis, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2013) Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template. MATERIALS CHEMISTRY AND PHYSICS, 138 (2-3). pp. 514-518.

S.M., Ab Gani, and N.H., Khanis, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2013) Effect of N2 flow rate on the properties of CNx thin films prepared by radio frequency plasma enhanced chemical vapor deposition from ethane and nitrogen. Thin Solid Films, 529. pp. 439-443.

S.M.A., Gani, and N.H., Khanis, and M.R., Muhamad, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2011) Effects of rf power on the structural properties of carbon nitride thin films prepared by plasma enhanced chemical vapour deposition. Thin Solid Films, 519 (15). pp. 4981-4986.

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