Items where Author is "R., Ritikos,"

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Number of items: 16.

Article

N., Chanlek, and D.S.B., Chia, and S.M., Hafiz, and N.M., Huang, and S.A., Rahman, and N.M., Razib, and R., Ritikos, and T., Saisopa, and P., Songsiriritthigul, and T.J., Witcher, (2014) A practical carbon dioxide gas sensor using room- temperature hydrogen plasma reduced graphene oxide. Sensors and Actuators B-Chemical, 193. pp. 692-700.

S.M.A., Gani, and N.H., Khanis, and M., Othman, and N.M.A., Rahman, and S.A., Rahman, and R., Ritikos, (2014) Effects of hydrogen dilution on CNx film properties deposited using rf PECVD from a mixture of ethane, nitrogen and hydrogen. Materials Chemistry and Physics, 144. pp. 377-384.

S.M., Ab Gani, and N.H., Khanis, and M.R., Muhamad, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2013) Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. power. Thin Solid Films, 529. pp. 459-463.

S.M., Ab Gani, and N.H., Khanis, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2013) Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template. MATERIALS CHEMISTRY AND PHYSICS, 138 (2-3). pp. 514-518.

S.M., Ab Gani, and N.H., Khanis, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2013) Effect of N2 flow rate on the properties of CNx thin films prepared by radio frequency plasma enhanced chemical vapor deposition from ethane and nitrogen. Thin Solid Films, 529. pp. 439-443.

S.M., Banihashemian, and N.M., Khatir, and W.H.A., Majid, and V., Periasamy, and S.A., Rahman, and R., Ritikos, (2012) Electrical Characterization of Gold-DNA-Gold Structures in Presence of an External Magnetic Field by Means of I-V Curve Analysis. Sensors, 12 (3). pp. 3578-3586.

S.K., Ngoi, and C.S., Ngoi, S.K., Yap, S.L., Goh, B.T., Ritikos, R., Rahman, S.A. and C.S., Ngoi, S.K., Yap, S.L., Goh, B.T., Ritikos, R., Rahman, S.A. and R., Ritikos, and Rahman, S.A. and S.L., Yap, (2012) Formation of Nano-Crystalline Phase in Hydrogenated Amorphous Silicon Thin Film by Plasma Focus Ion Beam Irradiation. Jurnal of Fusion Energy, 31 (1). pp. 96-103.

S.M.A., Gani, and M.R., Muhamad, and S.A., Rahman, and R., Ritikos, and Y.K., Yap, (2011) Catalyst-free formation of vertically-aligned carbon nanorods as induced by nitrogen incorporation. Carbon, 49 (6). pp. 1842-1848.

S.M.A., Gani, and N.H., Khanis, and M.R., Muhamad, and M., Othman, and S.A., Rahman, and N.M.A., Rashid, and R., Ritikos, (2011) Effects of rf power on the structural properties of carbon nitride thin films prepared by plasma enhanced chemical vapour deposition. Thin Solid Films, 519 (15). pp. 4981-4986.

S.M.A., Gani, and M.R., Muhamad, and S.A., Rahman, and R., Ritikos, and C.C., Siong, (2009) Effect of Annealing on the Optical and Chemical Bonding Properties of Hydrogenated Amorphous Carbon and Hydrogenated Amorphous Carbon Nitride Thin Films. Japanese Journal of Applied Physics, 48 (10). pp. 101301-101304.

Sharif, Khairul Anuar Mat and Muhamad, Muhamad Rasat and R., Ritikos, and S.A., Ritikos, R., Goh, B.T., Mat Sharif, K.A., Muhamad, M.R., Rah and Rahman, Saadah Abdul (2009) Highly reflective nc-Si:H/a-CNx:H multilayer films prepared by r.f. PECVD technique. Thin Solid Films, 517 (17). pp. 5092-5095.

S.A., Rahman, and Z.A., Rahman, and R., Ritikos, (2009) Studies on optical and photoluminescence properties of a-CNx thin films. Materials Research Innovations, 13 (3). pp. 168-170.

R., Awang, and S.A., Rahman, and R., Ritikos, (2006) The effects of deposition pressure on the optical and structural properties of d.c. PECVD hydrogenated amorphous carbon films. Materials Science Forum, 517. pp. 81-84.

Other

Z., Aspanut, and C.S., Kong, and M.R., Muhamad, and S.A., Rahman, and R., Ritikos, and G.B., Tong, and C.K., Wah, (2010) Fabrication and characterization of co-sputtering Au/SiO2 thin films prepared by RF magnetron sputtering. IEEE Xplore.

Z., Aspanut, and S.M.A, Gani, and S.A., Rahman, and R., Ritikos, (2009) Influence of nitrogen/methane ratio on the properties of hydrogenated amorphous carbon nitride deposited by r.f. PECVD technique. American Institute of Physics.

R., Awang, and S.M.A, Gani, and S.A., Rahman, and R., Ritikos, and G.B., Tong, (2006) Dependence of radio frequency power on optical, chemical bonding and photoluminescence properties of hydrogenated amorphous carbon nitride films. IEEE Xplore.

This list was generated on Thu Sep 21 02:03:28 2017 MYT.